Eindhoven Area, Netherlands
Experienced semicon process characterization, predictor & control modeller with optical CD tool for superior sort yield
Semiconductors
Education
Universiti Teknologi Malaysia 1994 — 1997
Bachelor of Engineering (B.Eng.), Mechanical Engineering
Kolej Sultan Abdul Hamid 1989 — 1993
SPM, Science and Accounting
Experience
ASML May 2014 - Present
ASML December 2013 - May 2014
Nanometrics August 2013 - November 2013
Nanometrics February 2011 - August 2013
KLA-Tencor September 2010 - December 2010
KLA-Tencor September 2007 - September 2010
KLA-Tencor August 2006 - August 2007
GLOBALFOUNDRIES July 2004 - June 2006
GLOBALFOUNDRIES November 2002 - June 2004
GLOBALFOUNDRIES June 2000 - October 2002
Skills
Klarity, Chemical Mechanical..., Klarity Defect, Semiconductors, Wafer Fab, Spectra Suite, Optical CD (OCD), Process Engineering, CDPE, Characterization, AFM, Photolithography, Design of Experiments, Klarity ACE, Ellipsometry, Failure Analysis, Neural Network, Silicon, Nanowire, OLSA, Multivariate Modeling, WVASE, Defect Elimination, Spectra Studio, Acushape, NANODiffract, Statistical Process..., Thin Films, Gate-All-Around (GAA), Lithography, RCF, Machine Learning, FinFET, Semiconductor Industry, Applications, FMEA, Defect, Etch, PVD, Clean Technology, SPC, JMP, CVD, Solidworks, Metrology, Process Control, Diffract Based Focus..., Materials Science